Description
MATRIX-F II Process Spectrometer
Optical spectroscopy is today a highly important technology for online process monitoring and optimization. Fiber-coupled probes allow a direct look into the process without time delay.
The MATRIX-F II FT-NIR spectrometer allows direct measurements in process reactors and pipelines, leading to a better understanding and control of the process. Its innovative technology provides consistent high quality results, less downtime and direct method transfer.
FT-NIR Process Monitoring
By using fiber optics technology, difficult-to-reach measurement points can be accessed by industry-hardened fiber optic probes, while the MATRIX-F II can be positioned remotely, for example in an analysis house.
Common process control applications include direct monitoring of chemical reactions and the quality of intermediate and final products:
- Direct measurement in process reactors or pipelines, over webs or conveyor belts
- Remote measurements over long distances
- Improved process understanding and control
- Determination of homogeneity of blending processes
- Determination of constituent concentrations and the state of polymerization processes
Maximum Utility
The MATRIX-F II can measure material in contact as well as contactless using fiber optic technology.
- Fiber Optic Probes: Diffuse reflectance, transflectance or transmission probes with various path lengths can be used, as well as process flow cells or pilot plant assemblies. Probe materials include stainless steel and Hastelloy.
- Heads for Contactless Measurements: Fiber optic NIR illumination and detection heads enable remote, contactless measurements. Up to six heads can be connected to one MATRIX-F II emission or MATRIX-F II duplex spectrometer.
The MATRIX-F II is available in different configurations for conventional fiber optic probes, contactless measurement heads, or the simultaneous use of both technologies.
Advanced Technology
The MATRIX-F II is a dedicated FT-NIR process spectrometer designed to withstand harsh environments. State-of-the-art optics provide outstanding sensitivity and stability, while industry-standard communication protocols allow easy integration into process environments.
- Accurate in-line results in seconds
- Multiple components per measurement
- Non-destructive analysis
- Optional built-in 6-port multiplexer
- Direct method transfer
- Rugged design
- 10 years warranty on moving parts of the interferometer and solid-state laser
- Ethernet connectivity and industry-standard communication protocols
The MATRIX-F II can also be installed in the laboratory as a stand-alone system for method development and then transferred directly into the process application. It is available as a free-standing unit with NEMA 5/IP65 splashproof housing or for mounting in a standard 19-inch rack in a temperature-controlled cabinet.
Additional Information
